Caltech Micromachining Laboratory Nanometer Gaps by Feedback-Controlled Electromigration

 

 

 

 

 

 

 

 

 

 

 

Project Abstract

Nanometer gap(or nanogap) is one of the most important devices in nanotechnology field. Park et al., proposed a simple way of using open-circuit electromigration to fabricate nanogaps. It is reported that the process is repeatable only if Au film is thinner than 20nm and large scatter of gap generation is a problem. Here, we add the feedback-control mechanism to the electromigration process and find that not only thicker film(120nm or thicker in our experiments) can produce repeatable nanogaps using this method, but also superior gap distance control and topology are obtained. Two approaches are then demonstrated to make as generated nanogaps freestanding. Finally, we develop a simple thermal-expansion calibration method to measure the gap distance without needing delicate instrument.

References

V. Shih, S. Zheng, A. Chang and Y.C. Tai,"Nanometer Gaps by Feedback-controlled Electromigration," Technical Digest, The 12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers '03), Boston, USA, pp. 1530-1533 (2003).

Involved Personnel

Victor Chi-Yuan Shih, Si-Yang Zheng, Alan Chang and Yu-Chong Tai