Caltech Micromachining Laboratory
Photo-patternable Gelatin as Protection
Layers in Surface Micromachines
Project Abstract
This paper describes a newly developed low-temperature photo-patternable Gelatin
technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting
and strengthening layer for weak MEMS micro- structures. Example demonstrated here is the
Gelatin process integrated with the Parylene MEMS technology. What is reported here is the
complete processing details and formulae that allow anyone to use Gelatin like photo-resist.
We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
Involved Personnel
Lung-Jieh Yang, Wei-Zhi Lin, *Tze-Jung Yao and *Yu-Chong Tai
Related Publications
X.Q. Wang, et al., “Parylene micro check valve”, Proceedings of the IEEE MEMS-1999, pp. 177-182, 1999.