Caltech Micromachining Laboratory

CALIFORNIA INSTITUTE OF TECHNOLOGY MICROMACHINING LABORATORY
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EE 187 - VLSI and ULSI Technology – Spring 2008

Professor: Dr. Yu-Chong Tai

TAs: Ray Huang and Yingying Wang

Office Hours are held in Moore 68 (in the basement). Questions can be also asked via email.

Office hours: Monday 8:30pm to 10:00pm, Tuesday 4:00pm to 5:30pm

Course Materials: Lecture Notes.

(Optional) Text Book:

Silicon Processing for the VLSI Era, Volume 1 - Process Technology, 2^nd Edition, S. Wolf and R.N. Tauber, Lattice Press, ISBN 0-9616721-6-1

Description:

9 units (3-0-6); first term. Prerequisites: APh/EE 9 ab, EE/APh 180 or instructor’s permission. This course is designed to cover the state-of-the-art micro/nanotechnologies for the fabrication of ULSI including BJT, CMOS, and BiCMOS. Technologies include lithography, diffusion, ion implantation, oxidation, plasma deposition and etching, etc. Topics also include the use of chemistry, thermal dynamics, mechanics, and physics.

Syllabus

Additional Readings

Immersion Lithography

Additional Lithography 1

Additional Lithography 2

Plasma Supplement

Class Notes:

week 1
week 2 (April 7^th and 9^th): Fabrication Overview (link in email)
week 3 (April 14^th and 16^th): Diffusion (link in email)

Homework: (NO COLLABORATION)

Problem Set	Due Date	Solutions	Mean	STD. DEV.
HW1	April 16^th in Class	HW1 Solutions
HW2	April 23^rd in Class	HW2 Solutions
HW3		HW3 Solutions
HW4		HW4 Solutions
HW5		HW5 Solutions